Tag: Nanoimprint lithography
Carpe Diem Technologies Issued NIL Patent – System and method for fabricating miniature structures on a flexible substrate
FRANKLIN, Mass. /Massachusetts Newswire/ -- Carpe Diem Technologies has been issued Patent US9804488 for the production of products incorporating NIL features. The system is entitled "System and method for fabricating miniature structures on a flexible substrate." The patent's key claims facilitate roll-to-roll or flexible panel manufacturing of very precise complex devices - inexpensively.
